Samsung Chemical Begins Mass Production of CNT Pellicle for Next-Generation Lithography Equipment - Intensified Competition in Japan's Semiconductor Industry

Samsung Chemical announced that it will begin mass production of carbon nanotube (CNT) pellicles used in next-generation lithography equipment for semiconductor manufacturing. This mass production involves installing production facilities at the Iwakuni Otaki Plant (Waki-cho, Yamaguchi Prefecture) in Japan, scheduled for completion in December 2025. The annual production capacity is 5,000 sheets, and the investment scale has not been disclosed.

Samsung Chemical's mass production of CNT pellicles is aimed at addressing the growing demand for advanced semiconductors. Pellicles are thin protective films attached to the surface of photomasks (semiconductor circuit wafers) to prevent scratches and dust from adhering, thereby improving the productivity of the lithography process.

Recently, with the accelerated utilization of artificial intelligence (AI), semiconductors responsible for data processing are facing demands for high-speed processing capabilities and low power consumption. To meet these demands, ultra-fine patterning of circuit lines is essential, leading to the active adoption of extreme ultraviolet (EUV) lithography technology for forming fine circuits.

Samsung Chemical plans to address these demands by commercializing CNT pellicles with high transmittance and light resistance suitable for the EUV lithography environment. This decision to mass-produce is expected to further intensify competition within the semiconductor industry in Japan.